distant places: Static units are usually situated remotely, escalating Price and reducing Over-all program efficiency.

thirty% of its peak electrical power intake, featuring our prospects important reduction in running fees and improved reliability.

Using the POU3500, you may achieve unparalleled results in etch overall performance, chamber uptime, decreased cost of possession and fab Room utilization – all even though enhancing your procedure dependability.

at first Started in 1985, our corporation has developed into a regarded leader in giving temperature Regulate systems to the global semiconductor marketplace.

This remarkable system, giving a small sort factor, cheap-of-possession and Dynamic Temperature Management made available process and tools engineers a fresh Resource to improve their temperature sensitive processes.

we have been guided in our belief that prosperity In this particular aggressive industry stems from furnishing prospects with remarkably engineered new products and solutions and earth class customer service.

The precision from the POU 3500 allows for unbiased Charge of the process fluid temperature towards the wafer chuck inside +/- 0.one °C of set place, and also the quick reaction time from the technique lets for optimum wafer-to-wafer repeatability through the entire etch course of action.

With our unit strategically mounted about 6 feet from your chamber, we reach a much more accurate studying of the chuck temperature. This technique assures regular temperature all through the production lot, leading to improved wafer-to-wafer CD uniformity.

big Footprint: Static units occupy substantial space throughout the fabrication Software spot, lessening its effectiveness.

Dynamic Temperature Handle, as implemented in devices much like the LAUDA-Noah POU, can be an tactic that senses the temperature of the method fluid getting back from the procedure chamber’s wafer chuck (ESC) and dynamically adjusts the temperature of your supplied system fluid according to this genuine-time feed-back.

The data set here is from the 200mm volume creation wafer fab and clearly illustrates the good thing about the LAUDA-Noah POU program.

The POU3300 technique features dynamic temperature Charge of the process chamber cathode / electrode / anode and may be synchronized with any etch approach.

The reality is that genuine Dynamic Temperature Manage can only be realized when all five (5) of the next program design and style and set up specifications are satisfied:

Watching cost-free motion pictures more info on the web is a effortless and frugal strategy to see the movies you're keen on correct from the ease and comfort of your very own house.

We have to have significantly less cooling/heating ability for a similar software being a static TCU on account of our smaller reservoir quantity.